Nanotexturing of Silicon by Metal-Assisted Chemical Etching
DOI:
https://doi.org/10.15330/pcss.16.1.140-144Keywords:
silicon nanostructures, photoelectric converter, meatl-asisted chemical etchingAbstract
This paper describes the method of metal assisted chemical etching (MacEtch) as an efficient approach for structuring the silicon surface with the ability to manage effectively the geometric parameters of the structures and their distribution on the surface of substrate. The surface texturing technology was presented and the structured silicon surfaces with regular and irregular types of surfaces have been obtained. This technology can be used for nanotexturing of the surface of silicon photovoltaic converters. The model of photovoltaic converter based on the crater-textured silicon surface with high efficiency was presented.
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