Investigation of conditions of synthesis of thin films of silver nitride (AgNO3) in a high-frequency low-pressure discharge

O.K. Shuaibov; O.Y. Minya; R.V. Hrytsak; A.O. Malinina; Z.T. Homoki

doi:10.15330/pcss.23.3.491-496

Authors

O.K. Shuaibov Uzhhorod National University, Uzhhorod, Ukraine
O.Y. Minya Uzhhorod National University, Uzhhorod, Ukraine
R.V. Hrytsak Uzhhorod National University, Uzhhorod, Ukraine
A.O. Malinina Uzhhorod National University, Uzhhorod, Ukraine
Z.T. Homoki Uzhhorod National University, Uzhhorod, Ukraine

DOI:

https://doi.org/10.15330/pcss.23.3.491-496

Keywords:

high-frequency discharge, thin films, silver nitride, radiation spectrum, plasma

Abstract

The results of studying the characteristics of a low-pressure high-frequency discharge in air (p = 10 Pa) for the synthesis of thin films from silver nitride, due to the ecton sputtering mechanism of a polycrystalline electrode from the compound Ag₂S, are presented. For the synthesis of thin films based on the AgNO₃ compound, the phenomenon of explosive emission of natural inhomogeneities on the surface of a polycrystalline electrode was used, in which, as a result of the destruction of electrodes from the Ag₂S superionic conductor, a silver vapor flow was formed, which, after interaction with a low-density air plasma, condensed in the form of silver nitride on placed near a dielectric substrate. The resulting films can be used in medicine, biotechnology, biomedical engineering, and agriculture.

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